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Scirj, Volume VI [2019]
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Scirj, Volume VI [2018]
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Scirj Volume VI, Issue V, May 2018 Edition
ISSN: 2201-2796

Phase-Controlled Deposition of Nickel Selenide, Nickel Sulfide Thin Films by Using Single-Molecular Precursors

TAGBO EMMANUEL EZENWA, JULIE CHINEZE OBI

Abstract: Synthesis and characterization of new ligands, (1a-b), and their complexes (2a-b) are hereby reported. All the compounds were confirmed using spectroscopic methods. The complexes (2a-b) were subsequently used as single molecular precursors for the deposition of nickel selenide, nickel sulfide thin films through aerosol- assisted chemical vapor deposition. The phase and purity of the as – deposited thin films were confirmed by thin film X-ray diffraction, which showed that the as-grown films were composed of mainly cubic NiSe2, monoclinic Ni3Se4 and hexagonal NiS phases only. The elemental composition of the thin films was determined by energy dispersive X- ray spectroscopy. Morphological studies of the as- deposited films were performed by using scanning electron microscopy, while the elemental composition of the thin films was also determined by energy-dispersive X-ray spectroscopy.

Reference this Paper: Phase-Controlled Deposition of Nickel Selenide, Nickel Sulfide Thin Films by Using Single-Molecular Precursors by TAGBO EMMANUEL EZENWA, JULIE CHINEZE OBI published at: "Scientific Research Journal (Scirj), Volume VI, Issue V, May 2018 Edition, Page 1-13 ".

Search Terms: Nickel sulfide, Nickel Selenide / Thin films / Chemical vapor deposition / Acyl chalcogourea

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